Activation of Strong Boron-Fluorine and Silicon-Fluorine sigma-Bonds: Theoretical Understanding and Prediction
Activation of Strong Boron-Fluorine and Silicon-Fluorine sigma-Bonds: Theoretical Understanding and Prediction
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强硼-氟和硅-氟西格玛键的活化:理论理解和预测
DOI:
10.1002/chem.201502197
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发表时间:
2015
期刊:
影响因子:
--
通讯作者:
Shigeyoshi Sakaki
中科院分区:
文献类型:
--
作者:
Hajime Kameo;Shigeyoshi Sakaki
The oxidative addition of BF3to a platinum(0) bis(phosphine) complex [Pt(PMe3)2] (1) was investigated by density functional calculations. Both thecisandtranspathways for the oxidative addition of BF3to1are endergonic (ΔG°=26.8 and 35.7 kcal mol−1, respectively) and require large Gibbs activation energies (ΔG°≠=56.3 and 38.9 kcal mol−1, respectively). A second borane plays crucial roles in accelerating the activation; thetransoxidative addition of BF3to1in the presence of a second BF3molecule occurs with ΔG°≠and ΔG° values of 10.1 and −4.7 kcal mol−1, respectively. ΔG°≠becomes very small and ΔG° becomes negative. A charge transfer (CT), F→BF3, occurs from the dissociating fluoride to the second non‐coordinated BF3. This CT interaction stabilizes both the transition state and the product. The BF σ‐bond cleavage of BF2ArF(ArF=3,5‐bis(trifluoromethyl)phenyl) and the BCl σ‐bond cleavage of BCl3by1are accelerated by the participation of the second borane. The calculations predict thattransoxidative addition of SiF4to1easily occurs in the presence of a second SiF4molecule via the formation of a hypervalent Si species.