Study on material removal for nanochannels fabrication using atomic force microscopy tip-based nanomilling approach
Study on material removal for nanochannels fabrication using atomic force microscopy tip-based nanomilling approach
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DOI：
10.1177/0954405417748188
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发表时间：
2019
期刊：
影响因子：
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通讯作者：
Yanquan Geng;Hao Li;Yongda Yan;Yang He;Xuesen Zhao
中科院分区：
文献类型：
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作者：
Yanquan Geng;Hao Li;Yongda Yan;Yang He;Xuesen Zhao
在本研究中，采用基于原子力显微镜尖端的纳米铣削方法在聚（甲基丙烯酸甲酯）表面上制造纳米通道。所有划痕测试均采用硅原子力显微镜尖端。结果表明，材料去除状态与常规单次划痕工艺明显不同。可以在纳米铣削操作期间形成切屑，并且因此可以降低材料堆积的高度。切屑的产生可能是由于刮削过程中一整圈切削角度和进给量的变化所致。此外，原子力显微镜划痕技术的这种特殊实施被证明可以形成纳米通道，在一次完整旋转过程中遵循两步过程：前半周期形成外轮廓，后半周期生成内轮廓并增加加工深度。详细研究了获得外轮廓和内轮廓的刮擦轨迹。最后，还研究了纳米铣削工艺的一个划痕周期中加工深度的变化。预计该方法可用于制造纳米流体应用中使用的纳米通道。
In the present study, an atomic force microscopy tip-based nanomilling approach is used to fabricate nanochannels on a poly(methyl methacrylate) surface. A silicon atomic force microscopy tip is employed for all the scratching tests. Results show that the material removal state is obviously different from the conventional single scratch process. Chips can be formed during the nanomilling operations and the height of the material pile-up can thus be reduced. The generation of chips may be attributed to the changes of the cutting angle and the feed value during one complete rotation of the scratching process. Moreover, this particular implementation of the atomic force microscopy scratching technique is proved to form nanochannels, following a two-step process during one complete rotation: the first half cycle forms the outer profile and the second half cycle generates the inner profile and increases the machined depth. The scratching trajectories to obtain the outer profile and inner profile are studied in detail. Finally, the change of machined depth in one scratching cycle for the nanomilling process is also investigated. It is anticipated that this method could be employed to fabricate nanochannel used in nanofluidic applications.