Monte Carlo calculation of hole initiated impact ionization in 4H phase SiC
Monte Carlo calculation of hole initiated impact ionization in 4H phase SiC
复制标题
4H相SiC空穴引发碰撞电离的蒙特卡罗计算
DOI:
10.1063/1.372426
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发表时间:
2000
期刊:
影响因子:
--
通讯作者:
R. Trew
中科院分区:
文献类型:
--
作者:
E. Bellotti;H. Nilsson;K. Brennan;P. Ruden;R. Trew
In this article, we present a comprehensive, full band theoretical study of the high field, hole transport properties of the 4H phase of silicon carbide (4H-SiC). The calculations are performed using a full band ensemble Monte Carlo simulation that includes numerically tabulated impact ionization rates, and phonon and ionized impurity scattering rates. In addition, the simulation includes a mechanism, interband tunneling, by which the holes can move between bands in the proximity of band intersection points. It is found that there exists a significant anisotropy in the calculated steady-state hole drift velocity for fields applied parallel and perpendicular to the c-axis direction. Good agreement with experimental measurements of the hole initiated impact ionization coefficient for fields applied along the c axis is obtained, provided that interband tunneling in the proximity of band intersections is included in the model. If interband tunneling is not included, the calculated ionization coefficients are ...