Microstructure and magnetic properties of highly textured Nd–Fe–B films grown on Ta (1 0 0)
Microstructure and magnetic properties of highly textured Nd–Fe–B films grown on Ta (1 0 0)
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Ta 上生长的高织构 Nd-Fe-B 薄膜的微观结构和磁性能 (1 0 0)
DOI：
10.1016/j.jmmm.2004.11.414
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发表时间：
2005
期刊：
影响因子：
--
通讯作者：
L. Schultz
中科院分区：
文献类型：
--
作者：
A. Kwon;U. Hannemann;V. Neu;S. Fähler;L. Schultz
采用脉冲激光沉积技术，在单晶MgO(100)衬底上沉积了CrTa复合缓冲层，制备了硬磁性NdFeB薄膜。在合适的温度下，这种衬底和缓冲层的系统允许Nd2Fe14B相的外延生长，c轴指向平面外。薄膜具有高达1.3T的矫顽力。在560°C到600°C之间，面内和面外的剩磁比低至0.1。使用该缓冲系统，420℃的适度衬底温度就足以沉积出1T以上的面外矫顽力的薄膜。
Hard magnetic Nd–Fe–B films were deposited by pulsed laser deposition on a combined Cr/Ta buffer layer on single crystalline MgO(100) substrates. At suitable temperatures this system of substrate and buffers allows epitaxial growth of the Nd2Fe14B phase with the c-axis pointing out-of-plane. The films exhibit coercivities up to 1.3T. The in-plane to out-of-plane remanence ratio between 560°C and 600°C is as low as 0.1. Using this buffer system a moderate substrate temperature of 420°C is sufficient to deposit films with an out-of-plane coercivity above 1T.