Atomic Layer Deposition of ZrO2 and HfO2 Nanotubes by Template Replication
Atomic Layer Deposition of ZrO2 and HfO2 Nanotubes by Template Replication
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DOI：
10.1149/1.3070617
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发表时间：
2009-01-01
影响因子：
--
通讯作者：
Abdel-Fattah, Tarek M.
中科院分区：
文献类型：
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作者：
Gu, Diefeng;Baumgart, Helmut;Abdel-Fattah, Tarek M.
采用原子层沉积（ALD）法在阳极氧化铝（AAO）模板内制备了高度有序的氧化锆和氧化铈纳米管。扫描电子显微镜和能量色散光谱被用来表征不同的ALD涂层的形态和元素组成。AAO孔的直径在200-300 nm的范围内，厚度为60 μ m。结果表明，自支撑纳米管在整个模板厚度上均匀生长。ALD工艺共形地复制AAO模板尺寸。ALD循环的次数控制所得纳米管壁厚度。
Highly ordered zirconia and hafnia nanotubes were fabricated by atomic layer deposition (ALD) within the anodic alumina oxide (AAO) template. Scanning electron microscopy and energy-dispersive spectroscopy were used to characterize the morphology and elemental compositions of the different ALD coatings. The diameters of the AAO pores are in the range of 200-300 nm with a thickness of 60 mu m. The results indicated that the freestanding nanotubes were uniformly grown through the entire template thickness. The ALD process conformally replicated the AAO template dimensions. The number of ALD cycles controlled the resultant nanotube wall thickness.