Low refractive index SiOF thin films prepared by reactive magnetron sputtering
Low refractive index SiOF thin films prepared by reactive magnetron sputtering
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DOI：
10.1016/j.tsf.2013.07.009
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发表时间：
2013-09-02
期刊：
影响因子：
2.1
通讯作者：
Yubero, F.
中科院分区：
文献类型：
--
作者：
Garcia-Garcia, F. J.;Gil-Rostra, J.;Yubero, F.
我们研究了反应磁控溅射法制备的低折射率氟掺杂二氧化硅薄膜。改变两个实验参数以增加膜的孔隙率、沉积过程的几何形状（即，掠射角沉积的使用）和在膜生长期间等离子体放电时化学蚀刻剂（氟物质）的存在。的微观结构，化学，光学性能，和孔隙率的薄膜已被其特征在于通过扫描电子和原子力显微镜，傅立叶变换红外光谱，X射线光电子能谱，紫外-可见光，和光谱椭圆偏振仪。据发现，无论是在掠射角的沉积或CFx的物种在膜生长过程中的等离子体放电中的掺入产生的沉积膜的折射率的降低。两种实验方法的组合效果进一步增强了膜的孔隙率。最后，在掠射几何制备的薄膜表现出负单轴双折射。(C)2013爱思唯尔有限公司版权所有。
We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to increase the porosity of the films, the geometry of the deposition process (i.e., the use of glancing angle deposition) and the presence of chemical etching agents (fluorine species) at the plasma discharge during film growth. The microstructure, chemistry, optical properties, and porosity of the films have been characterized by scanning electron and atomic force microscopy, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, UV-vis, and spectroscopic ellipsometry. It is found that either the deposition at glancing angles or the incorporation of CFx species in the plasma discharge during film growth produces a decrease in the refractive index of the deposited films. The combined effect of the two experimental approaches further enhances the porosity of the films. Finally, the films prepared in a glancing geometry exhibit negative uniaxial birefringence. (C) 2013 Elsevier B.V. All rights reserved.