Magnetic properties of reactively sputtered Fe1−xO and Fe3O4 thin films
Magnetic properties of reactively sputtered Fe1−xO and Fe3O4 thin films
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DOI：
10.1063/1.355869
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发表时间：
1994
影响因子：
3.2
通讯作者：
Young-geun Kim;M. Oliveria
中科院分区：
文献类型：
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作者：
Young-geun Kim;M. Oliveria
我们研究了厚度低于1000 A的Fe3O4薄膜的磁性能。先前的报道表明，厚度低于700 A的Fe3O4薄膜的饱和磁化强度异常下降。采用射频反应磁控溅射法制备了薄膜，考察了薄膜厚度、氧流量和衬底温度对薄膜的影响。在RT和400℃下，Fe3O4薄膜都有一个可接受的磁性能区域，不随薄膜厚度的变化而变化。在单相Fe3O4的加工区域内，磁性能不随氧分压的变化而变化，但随衬底温度的变化而变化。RT薄膜具有低饱和磁化强度（250 emu/cm3）和中等矫顽力（250 Oe）的特点。在400℃时，薄膜具有较高的饱和磁化强度，达到330 emu/cm3，但矫顽力也较高，达到450 Oe。较高温度下饱和磁化强度的增大是由于膜密度增大和密度减小所致。
We have investigated the magnetic properties of Fe3O4 thin films with thicknesses below 1000 A. Previous reports had indicated an anomalous decrease in the saturation magnetization of Fe3O4 films with thicknesses below 700 A. The films were prepared by reactive rf magnetron sputtering and effects of film thickness, oxygen flow rate, and substrate temperature were examined. A region of acceptable magnetic properties, which do not vary with film thickness, for Fe3O4 films has been found at both RT and 400 °C. Within the processing region for single‐phase Fe3O4, the magnetic properties did not vary significantly with oxygen partial pressure but did change with substrate temperature. The RT films are characterized by low saturation magnetization, 250 emu/cm3, and modest coercivity, 250 Oe. The films at 400 °C have a higher saturation magnetization, 330 emu/cm3, but also a higher coercivity, 450 Oe. The increased saturation magnetization at higher temperature results from the higher film density and lower degr...