Production of Controlled‐Morphology Pore Arrays: Implications and Opportunities
Production of Controlled‐Morphology Pore Arrays: Implications and Opportunities
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受控形态孔隙阵列的生产：意义和机遇
DOI：
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发表时间：
1987
期刊：
影响因子：
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通讯作者：
A. M. Glaeser
中科院分区：
文献类型：
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作者：
J. Rödel;A. M. Glaeser
一种技术，相结合的方法，离子束蚀刻，和热压，已经开发出来，它允许产生广泛的控制孔结构。几乎任何数量的孔，几乎任何尺寸和间距，都可以在晶界上用受控的磁感应产生。这种新方法允许开发新的实验，这是用来研究在晶粒生长过程中的孔阻力效应，裂纹愈合过程中的孔形态演变，小面行为，界面能，和奥斯特瓦尔德熟化的孔隙。
A technique, combining photolithographic methods, ion beam etching, and hot-pressing, has been developed, which permits the generation of a wide range of controlled pore structures. Pores in almost any number, and of almost any size and spacing, can be produced at grain boundaries with controlled misohentation. This new method has permitted the development of novel experiments, which are being used to study pore-drag effects during grain growth, pore morphology evolution during crack healing, faceting behavior, interfacial energies, and Ostwald ripening of pores.