Room-temperature Synthesis of Magnetite Films by Ferrite Plating.
Room-temperature Synthesis of Magnetite Films by Ferrite Plating.
复制标题
通过铁氧体电镀室温合成磁铁矿薄膜。
DOI：
10.3379/jmsjmag.24.515
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发表时间：
2000
影响因子：
--
通讯作者：
M. Abe
中科院分区：
文献类型：
--
作者：
K. Nishimura;Y. Kohara;Y. Kitamoto;M. Abe
在FeCl2水溶液中加入NaNO2 + NH3水溶液，实现Fe2 + → Fe3+氧化，在室温下通过铁氧体电镀法成功地生长了Fe3O4（磁铁矿）薄膜。由于我们发现铁的电位-pH图中的Fe2 +/Fe3O4（固体）边界线移动到较高pH区域，因此我们将水溶液的pH从5.0 - 6.8（在60 ° C-100 ° C下进行先前的镀覆时）增加到7.7 - 8.8。这有利于形成磁铁矿膜，其中包括单相磁铁矿，所揭示的X射线衍射。薄膜的饱和磁化强度与体样品的饱和磁化强度相当。膜沉积速率作为pH和NaNO2浓度的函数进行测量。
Fe3O4 (magnetite) films were successfully grown at room temperature by ferrite plating from an aqueous solution of FeCl2, utilizing Fe2+ → Fe3+ oxidation realized by adding an aqueous solution of NaNO2 + NH3 to the FeCl2 solution. Since we found that the Fe2+/Fe3O4 (solid) boundary line in the potential-pH diagram of iron shifts to the higher pH region, we increased the pH of the aqueous solution from 5.0-6.8 (at which previous plating was performed at 60°C-100°C) to 7.7-8.8. This facilitated the formation of magnetite films, which consist of single-phase magnetite, as revealed by X-ray diffraction. The magnitude of the films‘ saturation magnetization is equal to that of bulk samples. The film deposition rate was measured as a function of the pH and the concentration of NaNO2.