Structural determination of a NiO(111) film on Ni(100) by dynamical low‐energy electron‐diffraction analysis
Structural determination of a NiO(111) film on Ni(100) by dynamical low‐energy electron‐diffraction analysis
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通过动态低能电子衍射分析确定 Ni(100) 上 NiO(111) 薄膜的结构
DOI:
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发表时间:
1994
期刊:
影响因子:
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通讯作者:
P. Thiel
中科院分区:
文献类型:
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作者:
O. Warren;P. Thiel
The geometric structure of a NiO(111) film on Ni(100) has been determined by dynamical low‐energy electron‐diffraction analysis. The oxide film is sufficiently thick and uniform to carry out the analysis in the bulk crystal limit. Four orientational domains of NiO(111) are present. We consider four possible terminations of the oxide film (oxygen or nickel, fcc or hcp sites). Our results indicate that the oxide film terminates with a topmost layer of oxygen in fcc sites, and exhibits a 14.8% contraction in the first interlayer spacing relative to the ‘‘bulk’’ interlayer spacing of the film. The ‘‘bulk’’ lattice parameters of the oxide film are found to be uniformly compressed by 2.6% relative to bulk NiO(111). Comparison with other work suggests that oxygen termination, a strong contraction in the first interlayer spacing, and retention of cubic symmetry in deeper layers may be general characteristics of unreconstructed rocksalt(111) surfaces of metal oxide films.