Surface texturing effect on crack suppression of SiO2 film formed by F2 laser-induced photochemical surface modification of silicone on polycarbonate under heat resistance test
Surface texturing effect on crack suppression of SiO2 film formed by F2 laser-induced photochemical surface modification of silicone on polycarbonate under heat resistance test
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DOI：
10.7567/jjap.56.085502
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发表时间：
2017-07
影响因子：
1.5
通讯作者：
H. Nojiri;M. Okoshi
中科院分区：
文献类型：
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作者：
H. Nojiri;M. Okoshi
采用钢丝棉与钢丝摩擦处理的方法，在涂有有机硅的聚碳酸酯(PC)上成功制备了无裂纹的SiO_2薄膜，并在100℃和120℃下进行了3h的耐热试验。利用157nmF2激光对PC上的有机硅进行光化学表面修饰，形成了SiO_2薄膜。在激光辐照过程中，还用网状掩膜对改性后的二氧化硅层进行了分区。条带化的SiO_2层对激光辐照过程中的裂纹起到了抑制作用。然而，在耐热性测试中，即使是分区层也会产生裂缝。通过对试件表面的激光共聚焦显微镜观察，分析了裂纹产生的机理。摩擦后的样品具有较高的耐热性。原子力显微镜观察到改性后的SiO_2层表面有明显的织构，减小了SiO_2和硅胶在PC上的热膨胀系数的巨大差异，从而保持了光学透明性。
A crack-free SiO2 film was successfully fabricated on silicone-coated polycarbonate (PC) even under heat resistance tests at 100 and 120 °C for 3 h by an additional rubbing treatment with steel wool for use as an automobile window material. The SiO2 film was formed by 157 nm F2 laser-induced photochemical surface modification of silicone on PC. The modified SiO2 layer was also zoned with a mesh mask during the laser irradiation. The zoned SiO2 layer was effective for suppressing cracks during laser irradiation. However, even the zoned layer caused cracks under heat resistance tests. A mechanism of the cracking was analyzed on the basis of observations of sample surfaces by confocal laser microscopy. The rubbed samples showed high heat resistance. By atomic force microscopy, the surface of the modified SiO2 layer was clearly observed to be textured, which reduced the large difference in the thermal expansion coefficient between SiO2 and silicone on PC, thus maintaining optical transparency.