Thermoelectric properties of Cu-doped n-type (Bi2Te3)0.9-(Bi2-xCuxSe3)0.1(x = 0-0.2) alloys

Thermoelectric properties of Cu-doped n-type (Bi2Te3)0.9-(Bi2-xCuxSe3)0.1(x = 0-0.2) alloys
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DOI:
10.1016/j.jssc.2007.10.013
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发表时间:
2007-12
影响因子:
3.3
通讯作者:
J. Cui;L. Mao;Weiyou Yang;X. Xu;D. Chen;W. Xiu
J. Cui;L. Mao;Weiyou Yang;X. Xu;D. Chen;W. Xiu
中科院分区:
化学3区
文献类型:
--
作者:
J. Cui;L. Mao;Weiyou Yang;X. Xu;D. Chen;W. Xiu

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采用放电等离子烧结技术制备了(Bi2Te3)0.9-(Bi2−xCuxSe3)0.1(x=0~0.2)合金,并对其结构和热电性能进行了研究。Rietveld分析表明,掺铜母合金中约9.0%的铋原子被铜原子占据,只有不到4.0wt%的第二相Cu2.86Te2析出。测量表明,少量的Cu(x⩽)的引入可以降低晶格的热导率(κL),提高电导率和塞贝克系数。在417K时,x=0.1时的最佳无因次优值(ZT)为0.98,明显高于相同工艺制备的无铜Bi2Se0.3Te2.7(ZT=0.66)和Ag掺杂合金(ZT=0.86)。
n-Type (Bi2Te3)0.9–(Bi2−xCuxSe3)0.1(x=0–0.2) alloys with Cu substitution for Bi were prepared by spark plasma-sintering technique and their structural and thermoelectric properties were evaluated. Rietveld analysis reveals that approximate 9.0% of Bi atomic sites are occupied by Cu atoms and less than 4.0wt% second phase Cu2.86Te2precipitated in the Cu-doped parent alloys. Measurements show that an introduction of a small amount of Cu (x⩽0.1) can reduce the lattice thermal conductivity (κL), and improve the electrical conductivity and Seebeck coefficient. An optimal dimensionless figure of merit (ZT) value of 0.98 is obtained for x=0.1 at 417K, which is obviously higher than those of Cu-free Bi2Se0.3Te2.7(ZT=0.66) and Ag-doped alloys (ZT=0.86) prepared by the same technologies.