Development of a sub-MeV X-ray source via Compton backscattering
Development of a sub-MeV X-ray source via Compton backscattering
复制标题
通过康普顿背散射开发亚兆伏 X 射线源
DOI:
10.1016/j.nima.2010.02.042
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发表时间:
2011-05
期刊:
影响因子:
--
通讯作者:
Chen, L. -M.
中科院分区:
文献类型:
--
作者:
Kawase, K.;Fukuda, Y.;Faenov, A.;Shizuma, T.;Shimomura, T.;Yoshida, H.;Hajima, R.;Fujiwara, M.;Bulanov, S. V.;Kimura, T.;Tajima, T.;K;o, M.;Hayakawa, T.;Daito, I.;Kondo, S.;Homma, T.;Kameshima, T.;Kotaki, H.;Chen, L. -M.
At the Kansai Photon Science Institute of the Japan Atomic Energy Agency, we have developed a Compton backscattered X-ray source in the energy region of a few hundred keV. The X-ray source consists of a 150-MeV electron beam, with a pulse duration of 10ps (rms), accelerated by a Microtron accelerator and an Nd:YAG laser, with a pulse duration of 10ns (FWHM). In the first trial experiment, the X-ray flux is estimated to be (2.2±1.0)×102photons/pulse. For the actual application of an X-ray source, it is important to increase the generated X-ray flux as much as possible. Thus, for the purpose of increasing the X-ray flux, we have developed the pulse compression system for the Nd:YAG laser via stimulated Brillouin scattering (SBS). The SBS pulse compression has the great advantages of a high conversion efficiency and a simple structure. In this article, we review the present status of the Compton backscattered X-ray source and describe the SBS pulse compression system.
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影响因子:
56.9
作者:
Schoenlein, RW;Leemans, WP;Shank, CV
通讯作者:
Shank, CV
影响因子:
3.2
作者:
S. Kashiwagi;R. Kuroda;T. Oshima;F. Nagasawa;T. Kobuki;D. Ueyama;Y. Hama;M. Washio;K. Ushida;H. Hayano;J. Urakawa
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DOI:
10.1063/1.3204529
发表时间:
2009-07
期刊:
--
影响因子:
--
作者:
K. Kawase;T. Shimomura;M. Kando;H. Yoshida;S. V. Bulanov
通讯作者:
K. Kawase;T. Shimomura;M. Kando;H. Yoshida;S. V. Bulanov
DOI:
10.1016/s0375-9474(01)00490-0
发表时间:
2001-03
期刊:
Nuclear Physics
影响因子:
--
作者:
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通讯作者:
T. Nakano;J. Ahn;M. Fujiwara;H. Kohri;N. Matsuoka;T. Mibe;N. Muramatsu;M. Nomachi;H. Shimizu;K. Yonehara;M. Yosoi;T. Yorita;W. Chang;C. Wang;S. C. Wang;Y. Asano;T. Hotta;Y. Sugaya;R. Zegers;S. Daté;N. Kumagai;Y. Ohashi;H. Ohkuma;H. Toyokawa;T. Iwata;M. Miyabe;Y. Miyachi;A. Wakai;K. Imai;T. Ishikawa;T. Sasaki;H. Kawai;T. Ooba;Y. Shiino;M. Wada;H. Bhang;Z. Kim;A. Sakaguchi;M. Sumihama;K. Hicks;H. Akimune;T. Matsumura;C. Rangacharyulu;S. Makino
影响因子:
3.8
作者:
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通讯作者:
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