The relationship between milling a new silica-doped zirconia and its resistance to low-temperature degradation (LTD): a pilot study
The relationship between milling a new silica-doped zirconia and its resistance to low-temperature degradation (LTD): a pilot study
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研磨新型二氧化硅掺杂氧化锆与其耐低温降解性 (LTD) 之间的关系：初步研究
DOI：
10.4012/dmj.2011-048
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发表时间：
2012
影响因子：
2.5
通讯作者：
H.Yatani
中科院分区：
文献类型：
--
作者：
T.Nakamura;H.Usami;H.Ohnishi;H.Nishida;X.Tang;K.Wakabayashi;T.Sekino;H.Yatani
