Compression and strong rarefaction in high power impulse magnetron sputtering discharges
Compression and strong rarefaction in high power impulse magnetron sputtering discharges
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DOI：
10.1063/1.3525986
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发表时间：
2010-12-15
影响因子：
3.2
通讯作者：
Anders, Andre
中科院分区：
文献类型：
--
作者：
Horwat, David;Anders, Andre
在氩气中使用铜靶进行高功率脉冲磁控溅射 (HIPIMS) 放电时，观察到气体压缩和强烈稀疏。对于远远高于自溅射失控阈值的 HIPIMS 放电，同时记录了 35 个探针的时间分辨离子饱和电流。氩气背景压力是评估等离子体密度分布的空间和时间发展的参数。这些数据可以通过溅射通量（溅射风）的大量出现来解释，溅射通量（溅射风）导致气体瞬时致密化，随后稀疏并被持续自溅射的金属等离子体取代气体等离子体。等离子体密度脉冲在低压下紧随功率脉冲。在高压下，相对较远的探针仅在放电脉冲之后记录到密度峰值，这表明离子传输缓慢、扩散。 (c) 2010 年美国物理研究所。 [号码：10.1063/1.3525986]
Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport. (c) 2010 American Institute of Physics. [doi: 10.1063/1.3525986]