Far‐ and Near‐Field Heat Transfer in Transdimensional Plasmonic Film Systems

Far‐ and Near‐Field Heat Transfer in Transdimensional Plasmonic Film Systems
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跨维等离子体薄膜系统中的远场和近场传热

DOI:
10.1002/adom.202202712
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发表时间:
2023
影响因子:
9
通讯作者:
Bondarev, Igor V.
Bondarev, Igor V.
中科院分区:
材料科学2区
文献类型:
--
作者:
Biehs, Svend‐Age;Bondarev, Igor V.

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采用约束诱导非局域电磁响应模型研究了跨维等离子体薄膜系统中的辐射传热过程。将结果与等离子体中常规使用的标准局部Drude模型进行比较。前者预测远场的Woltersdorff长度更大,近场的热传递由表面等离子体激元主导的膜厚度更大。进行的分析表明,理论处理和实验数据的解释薄和金属薄膜系统必须包括约束诱导的非局部效应,以提供可靠的结果在辐射传热研究。增强的远场和近场辐射热传递发生在比标准Drude模型预测的厚得多的薄膜上,这一事实对于薄金属薄膜和涂层的热管理应用至关重要。
A confinement‐induced nonlocal electromagnetic response model is applied to study radiative heat transfer processes in transdimensional plasmonic film systems. The results are compared to the standard local Drude model routinely used in plasmonics. The former predicts greater Woltersdorff length in the far‐field and larger film thicknesses at which heat transfer is dominated by surface plasmons in the near‐field, than the latter. The analysis performed suggests that the theoretical treatment and experimental data interpretation for thin and ultrathin metallic film systems must incorporate the confinement‐induced nonlocal effect in order to provide reliable results in radiative heat transfer studies. The fact that the enhanced far‐ and near‐field radiative heat transfer occurs for much thicker films than the standard Drude model predicts is crucial for thermal management applications with thin and ultrathin metallic films and coatings.
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