RNA is more UV resistant than DNA: The formation of UV-induced DNA lesions is strongly sequence and conformation dependent
RNA is more UV resistant than DNA: The formation of UV-induced DNA lesions is strongly sequence and conformation dependent
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DOI：
10.1002/chem.200305731
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发表时间：
2004-11-19
影响因子：
4.3
通讯作者：
Carell, T
中科院分区：
文献类型：
--
作者：
Kundu, LM;Linne, U;Carell, T
对代表折叠良好的寡核苷酸结构的DNA和RNA发夹进行辐照，并用离子交换高效液相色谱直接定量损伤发夹的数量。通过ESI-HPLC-MS/MS实验确定了发夹中形成的光产物的类型。对具有系统变化的序列和构象(A和B)的发夹进行照射，显示出形成的光致渗出量的显著差异。因此，紫外线伤害地层是一个强烈依赖于序列和构象的过程。
DNA and RNA hairpins, which represent well-folded oligonucleotide structures, were irradiated and the amount of damaged hairpins was directly quantified by using ion-exchange HPLC. The types of photoproducts formed in the hairpins were determined by ESI-HPLC-MS/MS experiments. Irradiation of hairpins with systematically varied sequences and conformations (A versus B) revealed remarkable differences regarding the amount of photolesions formed. UV-damage formation is, therefore, a strongly sequence and conformation dependent process.