Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
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DOI：
10.1063/1.4756997
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发表时间：
2012-09-01
期刊：
影响因子：
1.6
通讯作者：
Hahn, Horst
中科院分区：
文献类型：
--
作者：
Leufke, Philipp M.;Kruk, Robert;Hahn, Horst
我们报告了长距离射频磁控溅射作为脉冲激光沉积和离轴溅射的竞争替代方案，用于外延 PbZr0.52Ti0.48O3 (PZT) 薄膜的生长。为了确定 PZT 薄膜的特性，研究重点是微观结构和铁电特性之间的相互作用。该薄膜沉积在绝缘或导电（掺铌）SrTiO3 和 MgO 基板上，并以 La0.83Sr0.17MnO3 作为底部电极。通过使用大面积 (1.0 mm(2)) 顶部电极证明了样品的均匀性和同质性。结果表明，可以从化学计量的 PZT 靶材沉积具有优异晶体和铁电质量的外延异质结构，而不需要靶材中存在过量的 PbO 或对样品进行后退火。版权所有 2012 作者。本文根据 Creative Commons Attribution 3.0 Unported License 分发。 [http://dx.doi.org/10.1063/1.4756997]
We report on large-distance rf-magnetron sputtering as a competitive alternative to pulsed laser deposition and off-axis sputtering for the growth of epitaxial PbZr0.52Ti0.48O3 (PZT) thin films. To determine the characteristics of the PZT films, the studies were focused on the interplay between microstructural and ferroelectric properties. The films were deposited on insulating or conducting (Nb-doped) SrTiO3 and MgO substrates with La0.83Sr0.17MnO3 as bottom electrode. The uniformity and homogeneity of the samples was demonstrated by using large area (1.0 mm(2)) top electrodes. It is shown that epitaxial heterostructures of excellent crystalline and ferroelectric quality can be deposited from a stoichiometric PZT target without the need for excess PbO in the target or post-annealing of the samples. Copyright 2012 Author(s). This article is distributed under a Creative Commons Attribution 3.0 Unported License. [http://dx.doi.org/10.1063/1.4756997]