The influence of substrate temperature and annealing on the properties of pulsed laser-deposited YIG films on fused quartz substrate
The influence of substrate temperature and annealing on the properties of pulsed laser-deposited YIG films on fused quartz substrate
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DOI：
10.1016/j.jmmm.2008.04.112
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发表时间：
2008-09
影响因子：
2.7
通讯作者：
Naresh Kumar;S. Prasad;D. S. Misra;N. Venkataramani;M. Bohra;R. Krishnan
中科院分区：
文献类型：
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作者：
Naresh Kumar;S. Prasad;D. S. Misra;N. Venkataramani;M. Bohra;R. Krishnan
采用脉冲激光沉积（PLD）技术，在室温（RT）~ 850°C的不同衬底温度（Ts）下，在熔融石英衬底上沉积了钇铁石榴石（YIG）薄膜。所有的薄膜在沉积状态下的X射线无定形和非磁性在RT。在温度Ta ~ 700°C退火后，在RT下沉积的薄膜显示出X射线峰和磁序。在较高的Ts（500-850°C）下沉积的膜然后在700°C下退火导致具有较高4π Ms值的更好质量的膜。在850°C下沉积并在700°C下退火的样品的磁化强度最高，为体相4π Ms值的68%。
Yttrium iron garnet (YIG) thin films were deposited on fused quartz substrate at different substrate temperatures (Ts) varying from room temperature (RT) to 850°C using pulsed laser deposition (PLD) technique. All the films in the as-deposited state were X-ray amorphous and non-magnetic at RT. The film deposited at RT after annealing at temperatures Ta⩾700°C showed both X-ray peaks and the magnetic order. The films deposited at higher Ts(500–850°C) and then annealed at 700°C resulted in better-quality films with higher 4πMsvalue. The highest value of magnetization was for the sample deposited at 850°C and annealed at 700°C, which is 68% of the bulk 4πMsvalue.