Photosensitization of base-developable poly(phenylhydrosilane) with 3,3', 4,4'-tetra(tert-butylperoxycarbonyl)benzophenone. Mechanism of the drastic photosensitization in terms of photoinduced electron transfer

Photosensitization of base-developable poly(phenylhydrosilane) with 3,3', 4,4'-tetra(tert-butylperoxycarbonyl)benzophenone. Mechanism of the drastic photosensitization in terms of photoinduced electron transfer
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可碱显影的聚(苯基氢硅烷)与3,3,4,4-四(叔丁基过氧羰基)二苯甲酮的光敏化。

DOI:
10.1021/ma980881i
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发表时间:
1998
期刊:
影响因子:
5.5
通讯作者:
S. Hayase
S. Hayase
中科院分区:
化学1区
文献类型:
--
作者:
Rikako Kani;Y. Nakano;H. Yoshida;S. Hayase

文献摘要

被引文献

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从光解速率和溶解速率的角度讨论了在3,3',4,4'-四(叔丁基过氧羰基)二苯甲酮(EA1)存在下,可碱显影剂(1)特别大光敏化的可能机理。光解速率的增加是通过从聚硅烷到电子受体的光诱导电子转移发生的。在EA1存在下的荧光猝灭速率与在二苯甲酮(EA2)存在下的荧光猝灭速率几乎相同。然而,EA1确实增加了光解速率和抗蚀敏感性,而EA2则没有。为了解释过氧化基团存在的重要性,从背电子转移的角度讨论了EA1和EA2之间的区别。在EA2的情况下,光诱导电子转移以及反向电子转移发生。在EA1中,二苯甲酮基团上过氧化物键的断裂会有效地抑制电子向1自由基阳离子的反向转移。C-60也有同样的现象。EA1光解形成含有羧酸的化合物,这也有助于光解产物溶解到碱性水溶液中。
A likely mechanism of especially large photosensitization for a base-developable poly-(phenylhydrosilane) resist (1) in the presence of 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone (EA1) is discussed in terms of photolysis rates and dissolution rates. The increase in the photolysis rate occurs through photoinduced electron transfers from polysilanes to electron acceptors. The fluorescence quenching rate of in the presence of EA1 is almost the same as that in the presence of benzophenone (EA2). However, EA1 does increase both photolysis rates and resist sensitivities, but EA2 does not. The difference between EA1 and EA2 is discussed in terms of back-electron transfer in order to explain the importance of the presence of peroxide moieties. In the case of EA2, photoinduced electron transfers as well as back-electron transfers occur. In case of EA1, the cleavage of peroxide bonds on the benzophenone moiety would effectively inhibit the back-electron transfer to the 1 radical cation. The same phenomena are observed for C-60. EA1 photodecomposes to form compounds bearing carboxylic acids which also facilitate the dissolution of photolysis products of into basic aqueous solutions.