An ice lithography instrument
An ice lithography instrument
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DOI：
10.1063/1.3601005
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发表时间：
2011-06-01
影响因子：
1.6
通讯作者：
Golovchenko, J. A.
中科院分区：
文献类型：
--
作者：
Han, Anpan;Chervinsky, John;Golovchenko, J. A.
我们描述了一种仪器的设计，该仪器可以完全实现一种称为冰光刻的新型纳米图案方法，其中冰被用作抗蚀剂。水蒸气被引入扫描电子显微镜（SEM）真空室上面的样品冷却到110 K。水蒸气凝结，在样品上覆盖了一层无定形的冰。在电子束光刻系统的引导下，通过扫描电镜电子束（电子束）去除冰以形成剥离掩模。在不破坏真空的情况下，带冰掩膜的样品随后被转移到金属沉积室中，在那里通过溅射沉积金属。然后将冷样品从真空系统中卸载，并在室温下浸在异丙醇中。当冰融化时，沉积在冰上的金属分散，而沉积在样品上的金属被电子束除去了冰。该仪器结合了配备电子束光刻系统的高光束电流热场发射SEM，低温系统和高真空金属沉积系统，设计优化了冰光刻技术，用于高通量纳米器件制造。通过制作纳米金属线，验证了该仪器的纳米性能。(C) 2011年美国物理研究所。(doi: 10.1063/1.3601005)
We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines. (C) 2011 American Institute of Physics. [doi:10.1063/1.3601005]