Edge-Epitaxial Growth of 2D NbS2-WS2 Lateral Metal-Semiconductor Heterostructures
Edge-Epitaxial Growth of 2D NbS2-WS2 Lateral Metal-Semiconductor Heterostructures
复制标题
二维 NbS2-WS2 横向金属半导体异质结构的边缘外延生长
DOI:
10.1002/adma.201803665
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发表时间:
2018
影响因子:
29.4
通讯作者:
Jun He
中科院分区:
文献类型:
--
作者:
Yu Zhang;Lei Yin;Junwei Chu;Tofik Ahmed Shifa;Jing Xia;Feng Wang;Yao Wen;Xueying Zhan;Zhenxing Wang;Jun He
2D metal‐semiconductor heterostructures based on transition metal dichalcogenides (TMDs) are considered as intriguing building blocks for various fields, such as contact engineering and high‐frequency devices. Although, a series of p–n junctions utilizing semiconducting TMDs have been constructed hitherto, the realization of such a scheme using 2D metallic analogs has not been reported. Here, the synthesis of uniform monolayer metallic NbS2on sapphire substrate with domain size reaching to a millimeter scale via a facile chemical vapor deposition (CVD) route is demonstrated. More importantly, the epitaxial growth of NbS2‐WS2lateral metal‐semiconductor heterostructures via a “two‐step” CVD method is realized. Both the lateral and vertical NbS2‐WS2heterostructures are achieved here. Transmission electron microscopy studies reveal a clear chemical modulation with distinct interfaces. Raman and photoluminescence maps confirm the precisely controlled spatial modulation of the as‐grown NbS2‐WS2heterostructures. The existence of the NbS2‐WS2heterostructures is further manifested by electrical transport measurements. This work broadens the horizon of the in situ synthesis of TMD‐based heterostructures and enlightens the possibility of applications based on 2D metal‐semiconductor heterostructures.