High quality factor GaAs microcavity with buried bullseye defects
High quality factor GaAs microcavity with buried bullseye defects
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DOI:
10.1103/physrevmaterials.2.052201
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发表时间:
2018-05
影响因子:
3.4
通讯作者:
K. Winkler;N. Gregersen;T. Häyrynen;B. Bradel;A. Schade;M. Emmerling;M. Kamp;S. Höfling;C. Schneider
中科院分区:
文献类型:
--
作者:
K. Winkler;N. Gregersen;T. Häyrynen;B. Bradel;A. Schade;M. Emmerling;M. Kamp;S. Höfling;C. Schneider
The development of high quality factor solid-state microcavities with low mode volumes has paved the way towards on-chip cavity quantum electrodynamics experiments and the development of high-performance nanophotonic devices. Here, we report on the implementation of a new kind of solid-state vertical microcavity, which allows for confinement of the electromagnetic field in the lateral direction without deep etching. The confinement originates from a local elongation of the cavity layer imprinted in a shallow etch and epitaxial overgrowth technique. We show that it is possible to improve the quality factor of such microcavities by a specific in-plane bullseye geometry consisting of a set of concentric rings with subwavelength dimensions. This design results in a smooth effective lateral photonic potential and therefore in a reduction of lateral scattering losses, which makes it highly appealing for experiments in the framework of exciton-polariton physics demanding tight spatial confinement.