Novel metal ion surface modification technique
Novel metal ion surface modification technique
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DOI：
10.1063/1.104318
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发表时间：
1991-04
影响因子：
4
通讯作者：
Ian G. Brown;X. Godechot;Kin Man Yu
中科院分区：
文献类型：
--
作者：
Ian G. Brown;X. Godechot;Kin Man Yu
我们描述了一种将金属离子施加到固体材料的近表面区域的方法。所添加的物质可以在表面下方被能量注入或者作为具有与衬底的原子混合界面的表面膜来建立;金属离子物质可以与衬底物质相同或不同，并且可以同时或顺序地施加多于一种金属物质。可以制造表面结构，包括单一金属、定制合金或金属多层的涂层和薄膜，并且它们可以被注入或添加到表面上并进行离子束混合。我们报告了该方法的两个简单演示：以70 keV的平均能量和1×1016原子/cm 2的剂量将钇注入到硅衬底中，以及用离子束混合到衬底上形成钛钇多层结构。
We describe a method for applying metal ions to the near‐surface region of solid materials. The added species can be energetically implanted below the surface or built up as a surface film with an atomically mixed interface with the substrate; the metal ion species can be the same as the substrate species or different from it, and more than one kind of metal species can be applied, either simultaneously or sequentially. Surface structures can be fabricated, including coatings and thin films of single metals, tailored alloys, or metallic multilayers, and they can be implanted or added onto the surface and ion beam mixed. We report two simple demonstrations of the method: implantation of yttrium into a silicon substrate at a mean energy of 70 keV and a dose of 1×1016 atoms/cm2, and the formation of a titanium‐yttrium multilayer structure with ion beam mixing to the substrate.