Efficient focusing of hard x rays to 25nm by a total reflection mirror
Efficient focusing of hard x rays to 25nm by a total reflection mirror
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DOI：
10.1063/1.2436469
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发表时间：
2007-01
影响因子：
4
通讯作者：
H. Mimura;H. Yumoto;S. Matsuyama;Y. Sano;K. Yamamura;Y. Mori;M. Yabashi;Y. Nishino;K. Tamasaku;T. Ishikawa;K. Yamauchi
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文献类型：
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作者：
H. Mimura;H. Yumoto;S. Matsuyama;Y. Sano;K. Yamamura;Y. Mori;M. Yabashi;Y. Nishino;K. Tamasaku;T. Ishikawa;K. Yamauchi
纳米聚焦X射线具有高空间分辨率和高灵敏度的特点，是X射线纳米分析/光谱分析中不可缺少的重要组成部分。利用全反射反射镜的聚焦系统是产生纳米聚焦X射线的最有前途的方法之一，因为它具有高效率和能量可调的聚焦特性。作者通过发展弹性发射加工、微拼接干涉术和相对角度可确定的拼接干涉术，研制了硬X射线反射镜的制造系统。利用超精密反射镜，实现了束宽25 nm、能量为15keV的硬X射线线聚焦。聚焦测试是在春八的1公里长的光束线上进行的。
Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25nm at 15keV. The focusing test was performed at the 1-km-long beamline of SPring-8.