Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification
Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification
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DOI：
10.1016/j.cplett.2006.05.074
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发表时间：
2006-08-04
影响因子：
2.8
通讯作者：
Ohdomari, Iwao
中科院分区：
文献类型：
--
作者：
Miyake, Takeo;Tanii, Takashi;Ohdomari, Iwao
研究了辛烯基三甲氧基硅烷（OCS）自组装膜作为高分辨电子束抗蚀剂的可行性。OCS SAM的乙烯基基团可以被修饰成羟基基团，这对于生物芯片制造是有用的。羟基修饰的OCS SAM比乙烯基封端的具有更高的灵敏度。通过使用羟基改性的OCS SAM作为EB抗蚀剂，实现了18 nm的小型化图案。由于羟基改性的OCS SAM是排斥许多蛋白质，这种方法可以用于制造分子尺度的蛋白质固定化模板。(c)2006 Elsevier B.V.保留所有权利。
The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale. (c) 2006 Elsevier B.V. All rights reserved.