Fabrication of microstructures by wet etching of anodic aluminum oxide substrates
Fabrication of microstructures by wet etching of anodic aluminum oxide substrates
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DOI:
10.1021/cm0486565
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发表时间:
2005-08-09
影响因子:
8.6
通讯作者:
Lee, KH
中科院分区:
文献类型:
--
作者:
Jee, SE;Lee, PS;Lee, KH
Anodic aluminum oxide (AAO) was used as substrates of microstructure fabrication. Complex structures with high aspect ratios were obtained by the single-step wet etching of the AAO substrates. Structures with different shapes and aspect ratios could be simultaneously obtained with vertical sidewalls. The surface morphology of the fabricated structures could be tailored. It is expected that various MEMS/NEMS devices can be built using this technique.