Metal-assisted chemical etching of silicon and nanotechnology applications
Metal-assisted chemical etching of silicon and nanotechnology applications
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DOI：
10.1016/j.nantod.2014.04.013
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发表时间：
2014-06-01
期刊：
影响因子：
17.4
通讯作者：
Lee, Woo
中科院分区：
文献类型：
--
作者：
Han, Hee;Huang, Zhipeng;Lee, Woo
与体相对应的硅纳米结构或其他半导体纳米结构相比，硅纳米结构在许多领域具有广阔的应用前景。因此，开发可控的硅纳米结构制备方法，探索硅纳米结构的进一步应用受到了广泛的关注。本文综述了金属辅助化学刻蚀硅的最新进展，金属辅助化学刻蚀是一种能够精细控制硅纳米结构形貌特征的低成本、通用的方法。并对硅纳米结构在能量转换和储能领域以及传感器方面的应用进行了综述。(C)2014年提交人。爱思唯尔有限公司出版。
Silicon nanostructures exhibit promising application potentials in many fields in comparison with their bulk counterpart or other semiconductor nanostructures. Therefore, the exploiting of controllable fabrication methods of silicon nanostructures, and the exploring of further applications of silicon nanostructures gain extensive attentions. In this review, recent advances in metal-assisted chemical etching of silicon, a low-cost and versatile method enabling fine control over morphology feature of silicon nanostructures, are summarized. The overview concerning the applications of silicon nanostructures in the field of energy conversion and storage, and sensors are also presented. (C) 2014 The Authors. Published by Elsevier Ltd.