Deep-UV fluorescence lifetime imaging microscopy
Deep-UV fluorescence lifetime imaging microscopy
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DOI：
10.1364/prj.3.000283
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发表时间：
2015-10-01
影响因子：
7.6
通讯作者：
Juodkazis, Saulius
中科院分区：
文献类型：
--
作者：
de Jong, Christiaan J.;Lajevardipour, Alireza;Juodkazis, Saulius
一种采用深紫外 240-280 nm 波长激发的新型荧光寿命成像显微镜 (FLIM) 已开发出来。 UV-FLIM 用于测量与缺陷相关的荧光及其在飞秒激光诱导熔融石英改性退火后的变化。这种 FLIM 技术可与微流体和生物样品一起使用，以表征 UV 激发时荧光的时间特性，这一功能可以轻松添加到基于标准显微镜的 FLIM 中。 UV-FLIM 经过测试，显示了超短激光脉冲二氧化硅结构引起的缺陷的退火。将频域荧光测量转换为时域，以从二氧化硅缺陷中提取长荧光寿命。 (C)2015中国激光出版社
A novel fluorescence lifetime imaging microscopy (FLIM) working with deep UV 240-280 nm wavelength excitations has been developed. UV-FLIM is used for measurement of defect-related fluorescence and its changes upon annealing from femtosecond laser-induced modifications in fused silica. This FLIM technique can be used with microfluidic and biosamples to characterize temporal characteristics of fluorescence upon UV excitation, a capability easily added to a standard microscope-based FLIM. UV-FLIM was tested to show annealing of the defects induced by silica structuring with ultrashort laser pulses. Frequency-domain fluorescence measurements were converted into the time domain to extract long fluorescence lifetimes from defects in silica. (C) 2015 Chinese Laser Press