Temperature-dependent magnetic resonance force microscopy studies of a thin Permalloy film
Temperature-dependent magnetic resonance force microscopy studies of a thin Permalloy film
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DOI：
10.1063/1.2715761
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发表时间：
2007-04-01
影响因子：
3.2
通讯作者：
Hammel, P. C.
中科院分区：
文献类型：
--
作者：
Nazaretski, E.;Thompson, J. D.;Hammel, P. C.
我们使用磁共振力显微镜（MRFM）研究了50 nm厚的连续坡莫合金薄膜。我们机械测量的铁磁共振信号在10和70 K之间的温度范围内的存在下，施加垂直于膜的表面的静磁场。测量结果表明，随着温度的升高，铁磁共振场减小。我们将这种行为归因于饱和磁化强度随温度的变化。我们的实验证明了MRFM作为温度的函数进行定量铁磁共振测量的潜力。(c)2007年，美国物理学会。
We used magnetic resonance force microscopy (MRFM) to study a 50 nm thick continuous Permalloy film. We mechanically measured the ferromagnetic resonance signal in the temperature range between 10 and 70 K in the presence of a static magnetic field applied normal to the surface of the film. The measurements show a decrease of the ferromagnetic resonance field with increasing temperature. We attribute this behavior to the temperature-dependent changes of the saturation magnetization. Our experiments demonstrate the potential of MRFM to perform quantitative ferromagnetic resonance measurements as a function of temperature. (c) 2007 American Institute of Physics.