Nanoimprint methods for the fabrication of macroscopic plasmonically active metal nanostructures
Nanoimprint methods for the fabrication of macroscopic plasmonically active metal nanostructures
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DOI：
10.1063/1.4976860
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发表时间：
2017-02
影响因子：
3.2
通讯作者：
R. Nagel;S. Filser;Tianyue Zhang;A. Manzi;Konrad Schönleber;James Lindsly;J. Zimmermann;T. Maier;G. Scarpa;K. Krischer;P. Lugli
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文献类型：
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作者：
R. Nagel;S. Filser;Tianyue Zhang;A. Manzi;Konrad Schönleber;James Lindsly;J. Zimmermann;T. Maier;G. Scarpa;K. Krischer;P. Lugli
在这篇文章中，我们提出了一种改进的纳米结构化方法，剥离纳米压印光刻（LO-NIL），它允许沉积高质量的金属纳米结构，由于双层抗蚀剂工艺，并将其与纳米转移印刷（nTP），一种纯添加剂金属印刷技术进行比较。LO-NIL和nTP被用作精确的方法，用于使用硅上的金纳米盘的示例在大面积上在半导体衬底上制造有序的等离子体金属纳米结构阵列。在制造过程期间LO-NIL中的特征尺寸调整的可能性对于在可见光和中红外范围之间调谐等离子体共振峰以及这些共振的微调特别有用。在UV-VIS-NIR光谱测量中，与用剥离技术制造的样品相比，发现nTP样品的等离子体共振中的显著蓝移。这一变化是由于金属/基体界面的粗糙度引起的。
In this article, we present a refined nanostructuring method, lift-off nanoimprint lithography (LO-NIL), which allows the deposition of high-quality metal nanostructures due to a bilayer resist process and compare it to nano-transfer printing (nTP), a purely additive metal printing technique. LO-NIL and nTP are used as accurate methods for the fabrication of ordered plasmonic metal nanostructure arrays on semiconducting substrates over large areas using the example of gold nanodisks on silicon. The possibility of feature size adjustment in LO-NIL during the fabrication process is especially useful for tuning plasmonic resonance peaks between the visible and the mid-infrared range as well as fine-tuning of these resonances. In UV-VIS-NIR spectroscopic measurements, a significant blueshift in the plasmonic resonance was found for nTP samples compared to the ones fabricated with the lift-off technique. It was concluded that this shift originates from a metal/substrate interface roughness resulting in a chang...