A 32-site neural recording probe fabricated by DRIE of SOI substrates
A 32-site neural recording probe fabricated by DRIE of SOI substrates
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DOI：
10.1088/0960-1317/12/4/312
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发表时间：
2002-07-01
影响因子：
2.3
通讯作者：
Hofmann, UG
中科院分区：
文献类型：
--
作者：
Norlin, P;Kindlundh, M;Hofmann, UG
一个全干硅蚀刻为基础的微加工工艺的神经探针的制造过程中证明了与32位记录电极阵列的探针。叉状探针轴形成的双面深反应离子蚀刻（DRIE）的绝缘体上硅（SOI）衬底，与掩埋的二氧化硅层作为蚀刻停止。轴通常具有5 mm x 25 mum x 20 mum的尺寸，并且以具有4的侧向锥角的凿形尖端结束。通过电子束蒸发在轴的顶部形成每个100 μ m（2）的铱电极阵列和Au导体迹线。设计了一种基于柔性印刷电路的配套互连解决方案，可实现探头的精确和灵活定位。在神经组织中。SEM研究显示了清晰的探针和探针唇。在盐水中的实验室测量中验证了电产额和功能。电极阻抗的幅度在1 kHz时在1 MOhm范围内，这与神经生理学记录一致。
An all-dry silicon-etch based micromachining process for neural probes was demonstrated in the manufacture of a probe with a 32-site recording electrode array. The fork-like probe shafts were formed by double-sided deep reactive ion etching (DRIE) of a silicon-on-insulator (SOI) substrate, with the buried SiO2 layer acting as an etch stop. The shafts typically had the dimensions 5 mm x 25 mum x 20 mum and ended in chisel-shaped tips with lateral taper angles of 4. An array of Ir electrodes, each 100 mum(2), and Au conductor traces were formed on top of the shafts by e-beam evaporation. An accompanying interconnect solution based on flexible printed circuitry was designed, enabling precise and flexible positioning of the probe.,, in neural tissue. SEM studies showed sharply defined probes and probe lips. The electrical yield and function were verified in bench-top measurements in saline. The magnitude of the electrode impedance was in the I MOhm range at 1 kHz, which is consistent with neurophysiological recordings.