Effect of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low-energy Ion Flux Irradiation

Effect of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low-energy Ion Flux Irradiation
复制标题

铜掺杂对低能离子束辐照辅助磁控溅射TiN薄膜结构与性能的影响

DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
--
中科院分区:
其他
文献类型:
--
作者:

文献摘要

相似文献