Designing Multicolored Photonic Micropatterns through the Regioselective Thermal Compression of Inverse Opals
Designing Multicolored Photonic Micropatterns through the Regioselective Thermal Compression of Inverse Opals
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DOI：
10.1002/adfm.201601095
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发表时间：
2016-07-05
影响因子：
19
通讯作者：
Kim, Shin-Hyun
中科院分区：
文献类型：
--
作者：
Lee, Joon-Seok;Je, Kwanghwi;Kim, Shin-Hyun
由于光的选择性衍射，胶体组件产生明显的结构颜色。具有多种结构颜色的微图案因其在各种光子应用中的应用而广受欢迎。这里，报道了一种光刻方法，该方法使用由加热到高温的负性光致抗蚀剂制成的反蛋白石的各向异性收缩来提供对微图案的大小、形状和颜色的高水平控制。收缩在整个薄膜厚度上均匀发生，导致结构颜色发生蓝移，同时在整个可见光光谱中保持高反射率。收缩速率由退火温度和光刻胶的交联度决定。因此，通过通过光掩模施加紫外线辐射，从单色反蛋白石创建多色微图案，可以对该速率进行空间调制。微图案特征的横向尺寸可以小到反蛋白石的厚度。
Colloidal assemblies develop pronounced structural colors due to the selective diffraction of light. Micropatterns with multiple structural colors are appealing for the use in a variety of photonic applications. Here, a lithographic approach is reported, which provides a high level of control over the size, shape, and color of a micropattern using the anisotropic shrinkage of inverse opals made of a negative photoresist heated to high temperatures. Shrinkage occurs uniformly across the thickness of the film, leading to a blueshift in the structural color while maintaining a high reflectivity across the full visible spectrum. The rate of shrinkage is determined by the annealing temperature and the photoresist crosslinking density. The rate can, therefore, be spatially modulated by applying UV radiation through a photomask to create multicolor micropatterns from single-colored inverse opals. The lateral dimensions of the micropattern features can be as small as the thickness of the inverse opal.