Photoelectron microscopy at Elettra: Recent advances and perspectives
Photoelectron microscopy at Elettra: Recent advances and perspectives
复制标题
DOI：
10.1016/j.elspec.2017.06.006
复制
发表时间：
2018-04-01
影响因子：
1.9
通讯作者：
Kiskinova, M.
中科院分区：
文献类型：
--
作者：
Amati, M.;Barinov, A.;Kiskinova, M.
Elettra的扫描光电子显微镜（SPEM）和X射线光电子显微镜（XPEEM）在成像和显微光谱学方面的互补能力为探索功能材料的特性（作为其形态和尺寸的函数）以及在操作过程中对其特性进行修改提供了独特的机会。本文介绍了目前在Elettra的SPEM和XPEEM的性能，通过选择最近的研究相关的石墨烯科学说明。正在进行的努力，实施SPEM设置允许在现实的操作条件下进行原位调查和PEEM设置自旋过滤动量显微镜的概述和讨论。(C)2017爱思唯尔B.V.保留所有权利。
The complementary capabilities of the Scanning PhotoElectron Microscopes (SPEM) and X-ray PhotoE-mission Electron Microscopes (XPEEM), operated at Elettra, in terms of imaging and micro-spectroscopy have opened unique opportunities to explore properties of functional materials as a function of their morphology and dimensions and to follow modifications in their properties during their operation. This paper describes the present performance of SPEMs and XPEEMs at Elettra, illustrated by selected recent studies relevant to graphene science. Ongoing efforts for implementing SPEM set-ups allowing for in situ investigations under realistic operating conditions and PEEM set-up for spin-filtered momentum microscopy are outlined and discussed as well. (C) 2017 Elsevier B.V. All rights reserved.