Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition

Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition
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DOI:
10.1088/0957-4484/19/30/305604
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发表时间:
2008-07-30
期刊:
影响因子:
3.5
通讯作者:
Van Haesendonck, Chris
Van Haesendonck, Chris
中科院分区:
材料科学3区
文献类型:
--
作者:
Malesevic, Alexander;Vitchev, Roumen;Van Haesendonck, Chris

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If graphene is ever going to live up to the promises of future nanoelectronic devices, an easy and cheap route for mass production is an essential requirement. A way to extend the capabilities of plasma-enhanced chemical vapour deposition to the synthesis of freestanding few-layer graphene is presented. Micrometre-wide flakes consisting of four to six atomic layers of stacked graphene sheets have been synthesized by controlled recombination of carbon radicals in a microwave plasma. A simple and highly reproducible technique is essential, since the resulting flakes can be synthesized without the need for a catalyst on the surface of any substrate that withstands elevated temperatures up to 700 degrees C. A thorough structural analysis of the flakes is performed with electron microscopy, x-ray diffraction, Raman spectroscopy and scanning tunnelling microscopy. The resulting graphene flakes are aligned vertically to the substrate surface and grow according to a three-step process, as revealed by the combined analysis of electron microscopy and x-ray photoelectron spectroscopy.