REVERSIBLE PHOTOCHEMICAL STRAIN IN LANGMUIR MONOLAYERS
REVERSIBLE PHOTOCHEMICAL STRAIN IN LANGMUIR MONOLAYERS
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DOI：
10.1103/physrevlett.44.590
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发表时间：
1980-01-01
影响因子：
8.6
通讯作者：
RONDELEZ, F
中科院分区：
文献类型：
--
作者：
GRULER, H;VILANOVE, R;RONDELEZ, F
本文报道了由聚甲基丙烯酸甲酯-螺吡喃共聚物（分子量215 000，5.1摩尔%螺吡喃）组成的单层在空气-水界面的光致力学响应的调查。用紫外光脉冲照射使螺吡喃发色团异构化，并导致饱和时的相对表面压力增加高达10%。光激发态具有典型的衰减时间常数为20分钟。用可见光照射使发色团返回到初始状态，使机械过程完全可逆。
This paper reports investigation of the photoinduced mechanical response of a mono-layer consisting of the copolymer poly (methyl methacrylate)-spiropyran (molecular weight 215 000, 5.1 mole% spiropyran) at an air-water interface. Irradiation with uv-light pulses isomerizes the spiropyran chromophore and leads to a relative surface-pressure increase up to 10% at saturation. The photoexcited state has a typical decay time constant of 20 min. Irradiation with visible light returns the chromophore to the initial state making the mechanical process fully reversible.