Reflectivity of Dense Plasma
Reflectivity of Dense Plasma
复制标题
稠密等离子体的反射率
DOI：
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发表时间：
1989
期刊：
影响因子：
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通讯作者：
Yu. B. Zaporogets
中科院分区：
文献类型：
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作者：
V. Mintsev;Yu. B. Zaporogets
本文报道了在P = 1.6-17 GPa的氙等离子体和P = 10- 46 GPa的硅冲击加载下，λ = 1.06 μm的激光束在绝缘体-金属过渡区的反射系数的测量结果。介绍了光爆实验装置的一些特点。讨论了稠密等离子体模型的反射图象以及与实验数据的比较。
The results of the measurements of the reflection coefficient of the laser beam with λ = 1.06 μm from dense xenon plasma at P = 1.6–17 GPa and silicon under shock loading up to the insulator-metal transition region at P = 10--46 GPa are presented. Some properties of the optical and explosive experimental setup are described. The reflection picture and comparison of the dense plasma models with the experimental data are discussed.