SURFACE ROUGHNESS AND IN-PLANE TEXTURING IN SPUTTERED THIN FILMS
SURFACE ROUGHNESS AND IN-PLANE TEXTURING IN SPUTTERED THIN FILMS
复制标题
溅射薄膜中的表面粗糙度和面内纹理
DOI：
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发表时间：
1998
期刊：
影响因子：
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通讯作者：
S. Yalisove
中科院分区：
文献类型：
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作者：
J. Whitacre;Z. Rek;J. Bilello;S. Yalisove
真实的表面在原子尺度上并不平坦。研究粗糙度对微观结构演变的影响是相关的，因为在许多应用中，薄膜溅射到非理想表面上。为此，制造了两种不同形态的非晶粗糙衬底，无论是细长的土丘或小平面。沉积到这些表面上的膜的微观结构的发展进行了检查。特别是，使用扫描电子显微镜、透射电子衍射和高分辨率X射线衍射（使用对称掠入射中的φ扫描）研究了在粗糙衬底上生长的400 nm厚Mo膜在生长平面中择优结晶取向的发展。X射线散射几何形状与同步加速器光源）。结果发现，纹理化的程度取决于沉积过程中的粗糙度和其取向的类型。粗糙表面通过限制入射原子通量的平均倾斜角，减缓了界面的发展。
Real surfaces are not flat on an atomic scale. Studying the effects of roughness on microstructural evolution is of relevance because films are sputtered onto nonideal surfaces in many applications. To this end, amorphous rough substrates of two different morphologies, either elongated mounds or facets, were fabricated. The microstructural development of films deposited onto these surfaces was examined. In particular, the development of a preferred crystallographic orientation in the plane of growth in 400 nm thick Mo films grown on the rough substrates was studied using scanning electron microscopy, transmission electron diffraction, and high resolution x-ray diffraction (using φ scans in the symmetric grazing incidence x-ray scattering geometry with a synchrotron light source). It was found that the degree of texturing was dependent upon the type of roughness and its orientation during deposition. By limiting the average oblique angle of incident adatom flux, rough surfaces slowed the development of in-...