An integrated CMOS micromechanical resonator high-Q oscillator
An integrated CMOS micromechanical resonator high-Q oscillator
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DOI:
10.1109/4.753677
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发表时间:
1999-04-01
影响因子:
5.4
通讯作者:
Howe, RT
中科院分区:
文献类型:
--
作者:
Nguyen, CTC;Howe, RT
A completely monolithic high-Q oscillator, fabricated via a combined CMOS plus surface micromachining technology, is described, for which the oscillation frequency is controlled by a polysilicon micromechanical resonator with the intent of achieving high stability. The operation and performance of micromechanical resonators are modeled, with emphasis on circuit and noise modeling of multiport resonators, A series resonant oscillator design is discussed that utilizes a unique, gain-controllable transresistance sustaining amplifier. We show that in the absence of an automatic level control loop, the closed-loop, steady-state oscillation amplitude of this oscillator depends strongly upon the de-bias voltage applied to the capacitively driven and sensed mu resonator, Although the high-Q of the micromechanical resonator does contribute to improved oscillator stability, its limited power-handling ability outweighs the Q benefits and prevents this oscillator from achieving the high short-term stability normally expected of high-Q oscillators.