Effects of Al content on hardness, lattice parameter and microstructure of Ti1-xAlxN films
Effects of Al content on hardness, lattice parameter and microstructure of Ti1-xAlxN films
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DOI：
10.1016/s0257-8972(99)00491-0
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发表时间：
1999-11-01
影响因子：
5.4
通讯作者：
Suzuki, T
中科院分区：
文献类型：
--
作者：
Kimura, A;Hasegawa, H;Suzuki, T
采用不同Al含量的Ti 1-xAlx合金靶，采用电弧离子镀法合成了Ti 1-xAlxN薄膜。薄膜的X射线衍射图谱表明，当x ≤ 0.6时，NaCl结构转变为x ≥ 0.7时的纤锌矿结构。对于x小于或等于0.6的膜，晶格参数与x值成比例地减小，并且相应地，硬度从x=0的2000 HV逐渐增加到x=0.6的3200 HV。从另一方面来说。x大于或等于0.7的膜的硬度突然从x=0.7的3000 HV下降到x=1的1400 HV。此外，扫描电子显微镜（SEM）和透射电子显微镜（TEM）观察表明，x=0.6的膜具有典型的柱状结构，晶粒尺寸为100-200 nm。当x ≥ 0.7时，薄膜中的柱状晶结构消失，多余的Al原子不像AlN那样在晶界偏聚，Ti和Al均匀溶解，形成具有纤锌矿结构的氮化物晶粒。(C)1999年Elsevier Science S.A. All rights reserved.
Ti1-xAlxN films were synthesized by the are ion plating method using Ti1-xAlx alloy targets with differing Al contents. X-ray diffraction patterns from films indicated that the NaCl structure for x less than or equal to 0.6 changed into wurtzite structure for x greater than or equal to 0.7. For films with x less than or equal to 0.6, the lattice parameter decreased in proportion to the x value, and correspondingly, the hardness gradually increased from similar to 2000 HV for x=0 up to 3200 HV for x=0.6. On the other hand. the hardness of films with x greater than or equal to 0.7 abruptly deceased from similar to 3000 HV for x=0.7 to 1400 HV for x=1. Further, scanning electron microscopy (SEM) and transmission electron microscopy (TEM) observations showed that the films with x=0.6 had a typical columnar structure with grain sizes of 100-200 nm. While for films with x greater than or equal to 0.7, a columnar structure disappeared and excess Al atoms did not segregate at the grain boundaries as AIN, but Ti and Al were uniformly dissolved and distributed as nitride grains with wurtzite structure. (C) 1999 Elsevier Science S.A. All rights reserved.