Study on photoluminescence from tris-(8-hydroxyquinoline)aluminum thin films and influence of light

Study on photoluminescence from tris-(8-hydroxyquinoline)aluminum thin films and influence of light
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三(8-羟基喹啉)铝薄膜的光致发光及其光影响的研究

DOI:
10.1063/1.2338566
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发表时间:
2006
影响因子:
4
通讯作者:
V. Narayanan
V. Narayanan
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
K. Thangaraju;J. Kumar;P. Amaladass;A. Mohanakrishnan;V. Narayanan

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合成了有机电致发光器件中最广泛使用的材料三-(8-羟基喹啉)铝(Alq3)。 Alq3 薄膜已沉积在玻璃和硅基板上。研究了光照对Alq3薄膜光学性能的影响。 PL衰减分析(双指数拟合)证实Alq3薄膜的光致发光(PL)源自其两种几何异构体,即面式和子午式。还证实,随着曝光时间的增加,两种异构体的 PL 都会降低,导致 Alq3 薄膜中产生发光猝灭剂。
Tris-(8-hydroxyquinoline)aluminum (Alq3), which is the most widely used material in organic electroluminescent devices, has been synthesized. Alq3 thin films have been deposited on glass and silicon substrates. The influence of light exposure on the optical properties of Alq3 thin films has been studied. It is confirmed that the photoluminescence (PL) of Alq3 thin film originates from its two geometrical isomers, namely, facial and meridional, which result from PL decay analysis (biexponential fit). It is also confirmed that the PL from both the isomers decreases for increasing light exposure time leading to the creation of luminescent quencher in Alq3 thin film.
DOI: --
发表时间: 2021
期刊:
影响因子: --
作者:
松尾 尚紀;金澤 有紘;青島 貞人;安部省吾 ・ 山 元 和哉 ・ 門川淳一
通讯作者: 安部省吾 ・ 山 元 和哉 ・ 門川淳一