Sputter Deposition of BiSrCaCuO Thin Films
Sputter Deposition of BiSrCaCuO Thin Films
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BiSrCaCuO 薄膜的溅射沉积
DOI：
10.1143/jjap.27.l632
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发表时间：
1988
影响因子：
1.5
通讯作者：
K. Hoshino
中科院分区：
文献类型：
--
作者：
M. Fukutomi;J. Machida;Yoshiaki Tanaka;T. Asano;H. Maeda;K. Hoshino
研究了超导Bi - Sr - Ca - Cu - O薄膜的溅射沉积，特别关注了沉积条件与所获薄膜超导性能之间的关系。经过退火后，从烧结的Bi1.3Sr1Ca1Cu1.5Ox靶材溅射的薄膜在83 K时呈现出零电阻的超导性。还证明了无需沉积后退火即可获得高Tc超导薄膜的可能性。
The sputter deposition of superconducting Bi-Sr-Ca-Cu-O thin films was studied with particular reference to the relation between the deposition conditions and the superconducting properties of the films obtained. After annealing, the films sputtered from a sintered Bi1.3Sr1Ca1Cu1.5Ox target exhibited superconductivity with zero-resistance at 83 K. The possibility of obtaining high-Tc superconducting film without post-deposition annealing was also demonstrated.