Room-Temperature Preparation of Ta Ions-Containing Ionic Liquid and its Vapor Deposition toward Ta-Oxide Film Coating
Room-Temperature Preparation of Ta Ions-Containing Ionic Liquid and its Vapor Deposition toward Ta-Oxide Film Coating
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DOI：
10.1149/1945-7111/ac48c5
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发表时间：
2022-01-01
影响因子：
3.9
通讯作者：
Matsumoto, Yuji
中科院分区：
文献类型：
--
作者：
Hozuki, Nana;Kaminaga, Kenichi;Matsumoto, Yuji
采用离子液体(IL)电洗脱法成功地制备出棕色、无沉淀的含Ta离子溶液。即使在室温下，只需在[Bmim][PF6]IL中施加+2.2V vs Ag的阳极电位，就可以很容易地洗脱覆盖有钝化氧化膜的交付使用的Ta金属板。根据Ta氧化所需的电荷量，推测离子液体中的大部分Ta离子处于+5的氧化态，X射线光电子能谱(XPS)也证实了这一点。发现IL中的Ta离子通过在真空中加热与IL分子一起热蒸发，在衬底上形成含有Ta离子的IL的沉积。在目前的条件下，通过蒸发过程，沉积物中的Ta浓度比原始体源中的Ta浓度唯一地降低了一个数量级左右。此外，还讨论了这种含Ta离子的离子镀膜及其在1000℃空气中退火在衬底上制备的块状液滴形成薄膜状Ta氧化物的可能性。
Ta ions-containing solutions, which are brown in color with no precipitation, were successfully prepared through an electroelution process with ionic liquid (IL). An as-delivered Ta metal plate covered with a passivation oxide film could be easily eluted even at room temperature by simply applying an anodic potential of, e.g. +2.2 V vs Ag in [Bmim][PF6] IL. According to the quantity of electric charge required for oxidation of Ta, most Ta ions in the IL were suggested to be in an oxidation state of +5, which was also confirmed by X-ray photoemission spectroscopy (XPS). Ta ions in IL were found to thermally evaporate together with IL molecules by heating in a vacuum, forming a deposit of the Ta ions-containing IL on a substrate. The Ta concentrations in the deposits were reduced uniquely by about one order of magnitude from those in the original bulk source through the evaporation process under the present conditions. Furthermore, a possibility of the formation of thin film-like Ta oxide from such a Ta ions-containing IL deposit and its bulk droplet prepared on substrates by annealing in air at 1000 degrees C will be discussed.