Effect of thermal annealing on laser damage resistance of KDP at 3ω
Effect of thermal annealing on laser damage resistance of KDP at 3ω
复制标题
DOI：
10.1117/12.804297
复制
发表时间：
2008-10
期刊：
影响因子：
--
通讯作者：
F. Guillet;B. Bertussi;D. Damiani;L. Lamaignère;A. Surmin;K. Vallé;C. Maunier
中科院分区：
文献类型：
--
作者：
F. Guillet;B. Bertussi;D. Damiani;L. Lamaignère;A. Surmin;K. Vallé;C. Maunier
为了表征热退火对KDP抗激光损伤性能的影响，将激光调节和热退火的几种组合应用于两个SHG KDP样品。一个样品在3ω，16ns下测试，另一个样品在3ω，2.5ns下测试。结果表明，虽然热退火改善了16ns脉冲的激光损伤，但在2.5ns的脉冲长度下没有效果。结合激光调节和热退火比单独的激光调节对激光损伤抗性具有更强的影响，即使对于2.5ns的脉冲长度，发现热退火具有很少或没有影响。还发现，对于短脉冲长度，当在激光调节之后施加热退火时获得最大增益。
In order to characterize the effect of thermal annealing on laser damage resistance of KDP, several combinations of laser conditioning and thermal annealing were applied to two SHG KDP samples. One sample was tested at 3ω, 16ns and the other one at 3ω, 2.5ns. Results show that whereas thermal annealing improves laser damage for a 16ns pulse, no effect can be measured at a pulse length of 2.5ns. Combining laser conditioning and thermal annealing has a stronger effect on laser damage resistance than laser conditioning alone, even for a 2.5ns pulse length for which thermal annealing was found to have little or no influence. It was also found that for a short pulse length maximum gain was obtained when thermal annealing was applied after laser conditioning.