Metalorganic chemical vapor deposition of oriented ZnO films over large areas
Metalorganic chemical vapor deposition of oriented ZnO films over large areas
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大面积取向ZnO薄膜的金属有机化学气相沉积
DOI：
10.1063/1.94243
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发表时间：
1983
影响因子：
4
通讯作者：
F. Smith
中科院分区：
文献类型：
--
作者：
F. Smith
描述了一种在商业上可用于 SiO2 沉积的简单系统中制备 c 轴取向 ZnO 薄膜的金属有机化学气相沉积方法。所得层的厚度高度均匀并粘附到各种基材上。简要描述薄膜的性能和结构。
A metalorganic chemical vapor deposition process for preparing c‐axis‐oriented ZnO films in a simple system of the type commercially available for SiO2 deposition is described. The resulting layers are highly uniform in thickness and adhere to a variety of substrates. Film properties and structure are described briefly.