Atomic and electronic band structures of Ti-doped Al2O3 grain boundaries
Atomic and electronic band structures of Ti-doped Al2O3 grain boundaries
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Ti掺杂Al2O3晶界的原子和电子能带结构
DOI:
10.1016/j.actamat.2020.10.018
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发表时间:
2020
期刊:
影响因子:
9.4
通讯作者:
Yuichi Ikuhara
中科院分区:
文献类型:
--
作者:
Chuchu Yang;Bin Feng;Wei Jiake;Eita Tochigi;Saki Ishihara;Naoya Shibata;Yuichi Ikuhara
Doping is one of the most popular strategies to modify the properties of polycrystalline materials, because the dopants prefer to segregate at the grain boundaries (GBs) and influence the structural and electronic properties of the materials. Understanding how dopants segregate at GBs and how they affect the resultant GB properties are essential. Here, we experimentally characterized the atomic structures and the electronic band structures of Ti-doped Σ7 {4 5¯ 10} and Σ7 {2 3¯ 10} GBs in α-Al 2 O 3 by atomic resolution scanning transmission electron microscopy (STEM), energy-dispersive X-ray spectroscopy (EDXS) and valence electron energy-loss spectroscopy (EELS). It was found that Ti preferentially segregated at specific atom sites driven by ionic size mismatch between Ti 3+ and Al 3+, which leads to structural transformations in both GBs. Direct valence EELS measurement revealed the segregation of Ti 3+ ions introduces impurity band within the bandgap in Al 2 O 3 GBs. These results provide an in-depth understanding of the local atomic and electronic band structures for Ti-doped GBs.