Application of Bayesian optimization for high-performance TiOx/SiOy/c-Si passivating contact

Application of Bayesian optimization for high-performance TiOx/SiOy/c-Si passivating contact
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DOI:
10.1016/j.solmat.2021.111251
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发表时间:
2021-09
影响因子:
6.9
通讯作者:
Shinsuke Miyagawa;K. Gotoh;K. Kutsukake;Y. Kurokawa;N. Usami
Shinsuke Miyagawa;K. Gotoh;K. Kutsukake;Y. Kurokawa;N. Usami
中科院分区:
材料科学2区
文献类型:
--
作者:
Shinsuke Miyagawa;K. Gotoh;K. Kutsukake;Y. Kurokawa;N. Usami

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我们报告了贝叶斯优化 (BO) 的应用,它可以加速许多参数的时间密集型工艺优化,以制造高性能氧化钛/氧化硅/晶体硅钝化接触。该工艺包括形成SiOy中间层的预沉积处理、TiOx的原子层沉积(ALD)以及作为后处理的氢等离子体处理(HPT)。我们尝试通过处理同一批次中三种化学溶液处理的样品来优化 ALD 和 HPT 的七个参数。这样可以同时对每个结构执行 BO 并确定最佳的预沉积处理。因此,通过仅 12 个循环和 10 次初始随机实验的 BO,通过独立测量饱和电流密度和接触电阻估计的载流子选择性 S10 得到显着改善。这些结果证明BO可以有效地提供多维参数空间中的实验条件,尽管我们需要考虑金属化工艺对钝化性能的影响。
We report on the application of Bayesian optimization (BO), which could accelerate the time-intensive process optimization of many parameters, to fabrication of the high-performance titanium oxide/silicon oxide/crystalline silicon passivating contact. The process contains pre-deposition treatment to form SiOyinterlayer, atomic layer deposition (ALD) of TiOx, and hydrogen plasma treatment (HPT) as post-process. We attempted to optimize seven parameters for ALD and HPT by dealing with samples treated by three kinds of chemical solutions in the same batch. This permits to perform BO for each structure at the same time and determine the superior pre-deposition treatment. Consequently, carrier selectivityS10estimated by independent measurements of the saturation current density and contact resistance was significantly improved by BO of only 12 cycles and 10 initial random experiments. These results certify that BO could efficiently provide experimental conditions in multidimensional parameter space although we need to consider the impact of the metallization process on the passivation performance.