The effects of methane in the deposition of superconducting niobium nitride thin films at ambient substrate temperature
The effects of methane in the deposition of superconducting niobium nitride thin films at ambient substrate temperature
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环境衬底温度下甲烷对超导氮化铌薄膜沉积的影响
DOI：
10.1063/1.332117
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发表时间：
1983
期刊：
影响因子：
--
通讯作者：
E. Cukauskas
中科院分区：
文献类型：
--
作者：
E. Cukauskas
铌-碳-氮系统的薄膜已经通过在氩-氮气氛中的射频二极管反应溅射在环境衬底温度下制备，其中控制量的甲烷添加到溅射气体中。超导转变温度约为11 ~ 15.85 °K。俄歇和X射线衍射分析表明，所有薄膜均为单相B1结构，在含碳量极低的薄膜中有少量β相六方结构。的超导性能，室温方块电阻，优选的微晶取向，和膜组合物的相关性进行了观察。研究结果表明，在薄膜沉积过程中，在环境衬底温度和适量的氮气和甲烷分压下，可以制备高Tc的氮化铌/碳氮化铌薄膜。这些薄膜在制备高Tc约瑟夫森隧道结方面具有潜在的应用价值。
Thin films of the niobium‐carbon‐nitrogen system have been prepared at ambient substrate temperature by rf diode reactive sputtering in an argon‐nitrogen atmosphere with controlled amounts of methane added to the sputter gas. Superconducting transition temperatures ranged from approximately 11 to 15.85 °K. Auger and x‐ray diffraction analysis indicate that all films were of the single phase B1 structure with a small amount of β‐phase hexagonal structure in the very low carbon containing films. A correlation of the superconducting properties, room temperature sheet resistance, preferred crystallite orientation, and film composition was observed. The results of this investigation show that high Tc niobium nitride/niobium carbonitride thin films can be prepared at ambient substrate temperatures with the proper amount of nitrogen and methane partial pressures during film deposition. These films have potential application for the fabrication of high Tc Josephson tunnel junctions.