High thermo-optic tunability in PECVD silicon-rich amorphous silicon carbide

High thermo-optic tunability in PECVD silicon-rich amorphous silicon carbide
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DOI:
10.1364/ol.476644
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发表时间:
2023-03-01
期刊:
影响因子:
3.6
通讯作者:
Yu, Paul K. L.
Yu, Paul K. L.
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Chang, Li-Yang Sunny;Pappert, Steve;Yu, Paul K. L.

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研究了等离子体增强化学气相沉积(PECVD)法制备的富硅非晶碳化硅(a-SiC)薄膜的热光系数(TOC)。我们发现,TOC的薄膜增加,其硅含量的增加。测量到TOC的三倍以上的改善,达到高达1.88 × 10-4 ℃-1的TOC,这与晶体硅的TOC相当。通过将富硅a-SiC微环结构与NiCr加热器相结合,也证明了一种有效的热光移相器。在1550 nm波长处测得调谐效率Ppi低至4.2 mW,调谐率为0.117 nm/mW。这些发现使得富硅a-SiC成为光子集成电路中热光应用的良好候选材料。(c)2023光学出版集团
In this work, the thermo-optic coefficient (TOC) of the silicon-rich amorphous silicon carbide (a-SiC) thin film deposited by plasma-enhanced chemical vapor deposition (PECVD) was characterized. We found that the TOC of the film increases as its silicon content increases. A more than threefold improvement in the TOC was measured, reaching a TOC as high as 1.88 x 10-4 degrees C-1, which is comparable to that of crystalline silicon. An efficient thermo-optic phase shifter has also been demonstrated by integrating the silicon-rich a-SiC micro-ring structure with a NiCr heater. Tunability of 0.117 nm/mW was demonstrated, and a corresponding tuning efficiency P pi as low as 4.2 mW has been measured at an optical wavelength of 1550 nm. These findings make silicon-rich a-SiC a good candidate material for thermo-optic applications in photonic integrated circuits.(c) 2023 Optica Publishing Group